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Active standard | Published: 05/12/2014
GB/T 14849.4-2014
Methods for chemical analysis of silicon metalPart 4Determination of impurity contentsInductively coupled plasma atomic emission spectrometric method
Available languages: English, Chinese
Available design: electronic design (pdf), Print design
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Detail information
Designation: GB/T 14849.4-2014
Publication date: 05/12/2014
Pages: 0
Country: Chinese technical standard
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