Active standard | Published: 10/05/2019

ISO 22415:2019

Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
(Analyse chimique des surfaces — Spectrométrie de masse des ions secondaires — Méthode de détermination du rendement volumique dans le cadre du profilage en profondeur de matériaux organiques par pulvérisation d´argon en grappe)

Available languages: English

Available design: electronic design (pdf), Print design

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Detail information

Designation: ISO 22415:2019

Publication date: 10/05/2019

Pages: 30

Country: International technical standard

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Anotation

Description / Abstract: This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.

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