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Withdrawn | Published: 15/05/1992
ASTM F1153-92(2002) Withdrawn
Standard Test Method for Characterization of Metal-Oxide-Silicon (MOS) Structures by Capacitance-Voltage Measurements (Withdrawn 2003)
Available languages: English
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Detail information
Designation: ASTM F1153-92(2002)
Publication date: 15/05/1992
Pages: 7
Note: Withdrawn
Country: American technical standard
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Keywords:capacitance-voltage, carrier concentration, fixed charge density, flatband capacitance, flatband voltage, metal-oxide-silicon structures, mobile ionic charge, MOS structures, silicon, ICS Number Code 31.060.01 (Capacitors in general)
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