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Withdrawn | Published: 10/01/2002
ASTM F1239-02 Withdrawn
Standard Test Methods for Oxygen Precipitation Characterization of Silicon Wafers by Measurement of Interstitial Oxygen Reduction (Withdrawn 2003)
Available languages: English
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Detail information
Designation: ASTM F1239-02
Publication date: 10/01/2002
Pages: 5
Note: Withdrawn
Country: American technical standard
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Keywords:delta O, interstitial oxygen, oxygen precipitation, oxygen reduction, silicon, ICS Number Code 29.045 (Semiconducting materials)
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