Active standard | Published: 21/11/2022

ISO 14606:2022-ed.3.0

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
(Analyse chimique des surfaces — Profilage d´épaisseur par bombardement — Optimisation a l´aide de systemes mono- ou multicouches comme matériaux de référence)

Available languages: English

Available design: electronic design (pdf), Print design

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Detail information

Designation: ISO 14606:2022-ed.3.0

Publication date: 21/11/2022

Pages: 17

Country: International technical standard

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Anotation

Description / Abstract: This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.

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