Aktivní norma | Vydána: 23.08.2017

IEC 62880-1-ed.1.0

Semiconductor devices - Stress migration test standard - Part 1: Copper stress migration test standard

Dostupné jazyky: Anglicky

Dostupné provedení: Elektronické PDF, Tištěné, CD-ROM

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Podrobné informace

Označení: IEC 62880-1-ed.1.0

Datum vydání: 23.08.2017

Stran: 24

Země: Mezinárodní technická norma

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Anotace

IEC 62880-1:2017(E) describes a constant temperature (isothermal) aging method for testing copper (Cu) metallization test structures on microelectronics wafers for susceptibility to stress-induced voiding (SIV). This method is to be conducted primarily at the wafer level of production during technology development, and the results are to be used for lifetime prediction and failure analysis. Under some conditions, the method can be applied to package-level testing. This method is not intended to check production lots for shipment, because of the long test time.

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