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Withdrawn | Published: 01/01/1992
ASTM F1366-92(2002) Withdrawn
Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)
Available languages: English
Available design: Online Secure PDF
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Detail information
Designation: ASTM F1366-92(2002)
Publication date: 01/01/1992
Pages: 5
Note: Withdrawn
Country: American technical standard
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Keywords:FTIR, oxygen, secondary ion mass spectometry, silicon, ICS Number Code 29.045 (Semiconducting materials)
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