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Active standard | Published: 31/10/2025
GB/T 14847-2025
Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method
Available languages: English, Chinese
Available design: electronic design (pdf), Print design
from 238.80 USD
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Detail information
Designation: GB/T 14847-2025
Publication date: 31/10/2025
Pages: 0
Country: Chinese technical standard
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