Active standard | Published: 18/05/2004

ISO 17331:2004

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
(Analyse chimique des surfaces — Méthodes chimiques pour collecter les éléments analysés de tranches de silicium comme matériaux de référence pour l´analyse par spectroscopie de fluorescence X en réflexion totale (TXRF))

Available languages: English

Available design: electronic design (pdf), Print design

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Detail information

Designation: ISO 17331:2004

Publication date: 18/05/2004

Pages: 18

Country: International technical standard

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Anotation

Description / Abstract: ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.

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