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Active standard | Published: 20/01/2026
JIS K0160:2026
Surface chemical analysis-Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
Available languages: Japanese
Available design: electronic design (pdf), Print design
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Detail information
Designation: JIS K0160:2026
Publication date: 20/01/2026
Pages: 24
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