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Withdrawn | Published: 10/12/2002
ASTM F1727-02 Withdrawn
Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 2003)
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Detail information
Designation: ASTM F1727-02
Publication date: 10/12/2002
Pages: 3
Note: Withdrawn
Country: American technical standard
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Keywords:defects, dislocation, epitaxy, hillock, imperfections, oxidation, preferential etch, shallow pit, silicon, slip, stacking fault, swirl, ICS Number Code 29.045 (Semiconducting materials)
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