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Active standard | Published: 01/06/2026
ISO 19383:2026
Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
(Dépôt de couches atomiques — Caractéristiques chimiques et spécifications de processus associées des précurseurs pour le dépôt de couches atomiques)
Available languages: English
Available design: electronic design (pdf), Print design
from 128.90 EUR
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Detail information
Designation: ISO 19383:2026
Publication date: 01/06/2026
Pages: 13
Country: International technical standard
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You can buy at www.mystandards.bizAnotation
Description / Abstract: This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.Popular Publishers
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