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Active standard | Published: 18/06/2019
ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
(Céramiques techniques — Méthode d’essai pour déterminer la résistance au plasma des composants céramiques dans les équipements de production a semi-conducteurs)
Available languages: English
Available design: electronic design (pdf), Print design
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Detail information
Designation: ISO 21859:2019
Publication date: 18/06/2019
Pages: 4
Country: International technical standard
Where to buy?
You can buy at www.mystandards.bizAnotation
Description / Abstract: This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.Popular Publishers
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