Cookies
Potřebujeme Váš souhlas k využití jednotlivých dat, aby se Vám mimo jiné mohli ukazovat informace týkající se Vašich zájmů. Souhlas udělíte kliknutím na tlačítko „OK“.
Active standard | Published: 15/06/2022
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
(Analyse chimique des surfaces — Profilage d´épaisseur — Profilage d´épaisseur non destructif de films minces d´oxydes de métaux lourds a l´échelle nanométrique sur des substrats de Si par diffusion d´ions de moyenne énergie)
Available languages: English
Available design: electronic design (pdf), Print design
from 235.00 USD
show on eshop
Detail information
Designation: ISO 23170:2022
Publication date: 15/06/2022
Pages: 29
Country: International technical standard
Where to buy?
You can buy at www.mystandards.bizAnotation
Description / Abstract: This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).Popular Publishers
DIN standards
BS standards
ASTM standards
ISO standards
IEC standards
Copyright © All rights reserved | This template is made with by Colorlib
