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Active standard | Published: 03/08/2026
ISO 25164:2026
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
(Revetements obtenus par dépôt physique en phase vapeur — Dépôt de couches minces de TiAlSiN par pulvérisation cathodique magnétron — Spécification)
Available languages: English
Available design: electronic design (pdf), Print design
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Detail information
Designation: ISO 25164:2026
Publication date: 03/08/2026
Pages: 6
Country: International technical standard
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Description / Abstract: This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering. This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.Popular Publishers
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