GB - Chinese national standards

Test method for measuring the Al fraction in AlGaAs on GaAs substrates by high resolution X-ray diffraction

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Test methods for analyzing organic contaminants on silicon wafer surfaces by thermal desorption gas chromatography

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Test method for measuring surface metal contamination on semiconductor wafers —Total reflection X-Ray fluorescence spectroscopy

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Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-atomic absorption spectroscopy

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Test method for measuring boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry

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Test method for and impurities content in single crystal silicon—Low temperature FT-IR analysis method

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Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method

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Vanadium-nitrogen—Determination of vanadium content—Ammonium ferrous sulfate titration method

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Vanadium-nitrogen—Determination of nitrogen content—Thermal conductimetric method after fusion in a current of inert gas

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Vanadium-nitrogen—Determination of nitrogen content—Distillation-neutralization titration method

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