JIS - Japanese technical standards

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JIS K0154:2017 (21.8.2017)

JIS K0154:2017 (21/08/2017)

Surface chemical analysis -- Guidelines for preparation and mounting of specimens for analysis

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 531.30 USD more info
JIS K0155:2025 (20.5.2025)

JIS K0155:2025 (20/05/2025)

Surface chemical analysis-Secondary ion mass spectrometry-Linearity of intensity scale in single ion counting time-of-flight mass analysers

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 8 475.20 USD more info
JIS K0156:2018 (20.8.2018)

JIS K0156:2018 (20/08/2018)

Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 531.30 USD more info
JIS K0157:2021 (20.7.2021)

JIS K0157:2021 (20/07/2021)

Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 531.30 USD more info
JIS K0158:2021 (20.7.2021)

JIS K0158:2021 (20/07/2021)

Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 531.30 USD more info
JIS K0159:2021 (22.11.2021)

JIS K0159:2021 (22/11/2021)

Surface chemical analysis -- Scanning-probe microscopy -- Determination of geometric quantities using SPM: Calibration of measuring systems

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 6 003.30 USD more info
JIS K0160:2026 (20.1.2026)

JIS K0160:2026 (20/01/2026)

Surface chemical analysis-Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 8 475.20 USD more info
JIS K0161:2010 (20.4.2010)

JIS K0161:2010 (20/04/2010)

Surface chemical analysis -- Auger electron spectroscopy -- Description of selected instrumental performance parameters

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 060.50 USD more info
JIS K0162:2010 (20.4.2010)

JIS K0162:2010 (20/04/2010)

Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 3 060.50 USD more info
JIS K0163:2010 (20.4.2010)

JIS K0163:2010 (20/04/2010)

Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials

Available languages: Japanese

Available design: electronic design (pdf), Print design

from 2 118.80 USD more info
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